Thursday, October 25, 2007
Production of a new generation of microprocessors has begun at Intel Corp.'s first high-volume, 45-nm fab.
The Chandler, Ariz.-based 300-mm plant, called Fab 32, is a $3 billion factory that was originally announced in 2005. At the time of the announcement, production for Fab 32 was aimed for the second half of 2007.
The fab will use Intel's 45-nm process technology built around a hafnium-based high-k material for the gate dielectric and metal materials for the gate.
''The opening of Fab 32 in Arizona today is a testament to Intel's continued investment in our most strategic asset -- the most advanced, environmentally friendly manufacturing network in the world,'' said Paul Otellini, Intel president and CEO, in a statement.
Fab 32 is Intel's sixth 300-mm wafer factory and its second factory to produce 45-nm chips. Intel first produced 45-nm processors in its Oregon development facility, called D1D, in January and is now moving into high-volume production with the opening of Fab 32.
Two additional 45-nm, 300-mm manufacturing factories are scheduled to open next year in Kiryat Gat, Israel (Fab 28) and Rio Rancho, N.M. (Fab 11x).
Fab 32 is also key. With 184,000-square-feet of clean room space, the completed Fab 32 structure measures 1-million-square feet. More than 1,000 employees will operate the factory.
Intel's 45-nm process is said to result in a 15 percent reduction in global warming emissions, and Fab 32 makes use of Intel Arizona's water conservation and reuse program which conserves more than 70 percent of the water.
The company also announced that it intends to seek certification for the new fab as the company's first official Leadership in Energy and Environmental Design (LEED) factory. LEED is a green building rating system developed by the U.S. Green Building Council that provides a set of standards for environmentally sustainable construction and requires several months of operating data before certification can be completed.
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