Intel said today it has dropped plans to buy 157nm lithography tools and will use its 193nm tools for the 45nm node.

Intel had previous lithography roadmap called for 157nm implementation around 2007. That has been scrapped, with the chipmaker now staying on 193nm tools, skipping 157nm all together, and going straight to Extreme Ultraviolet (EUV) tools for 32nm production around 2009.

"Basically, it's technical problems with the 157nm tools. Because of these problems the tools would not be able to meet our schedule for when we would need them here for production in 2007," a spokesman for Intel said, noting documented problems such as the short supply and expense of cilium fluoride, a necessary part of the forgoed tools.

Intel pointed out that the lithography issues are not solely with its supplier ASML Holdings N.V., which was slated to provide Intel its 157nm technology, and are present across the board.

ASML said it had been informed by Intel of its decision, but it hopes that other companies will still buy the 157nm machines, according to Reuters.

By: Docmemory
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