Thursday, June 12, 2003
ASML MaskTools Inc. has recently awarded its phase-shift photomask technology for advanced IC production to Taiwanese DRAM maker Nanya Technology Corp. ASML has licensed its Nanya license and deploy ASML's MaskRigger software, which will enable the use of scattering bar technology for its photomasks.
The MaskRigger technology is designed to improve the image quality of the design patterns being transferred from mask to wafer, according to ASML MaskTool, a subsidiary of ASML Holding NV of the Netherlands.
ASML Mask Tools has also licensed its technology to other DRAM makers, notably Samsung Electronics Co. Ltd. The scattering bar technology from ASML MaskTools “as proven to be widely applicable for high volume DRAM manufacturing," said Dinesh Bettadapur, president and CEO of ASML MaskTools, in a statement. "Nanya will benefit from the enhanced imaging performance offered by our complete solutions package which includes full-chip implementation software, manufacturing IP and applications support," he said.
By: DocMemory
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