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Panasonic to build 300mm fab for consumer IC's


Monday, January 12, 2004

Matsushita Electric Industrial Co. Ltd. said today that it would construct a new semiconductor production facility at one of its existing plants.

The Tokyo-based company, best known for the Panasonic brand name, said the new $1.2 billion (130 billion Japanese yen) facility would be located at its Uozu plant in Toyama Prefecture.

The new facility will be designed to increase Matsushita's production of advanced system LSIs for consumer electronics using 90-nanometer process technology and 300mm wafers.

The company will begin construction in May and launch production towards the end of 2005. At full capacity the facility will produce 7,500 wafers per month.

Matsushita's plans also call for upgrading the facility to 65nm and beyond as the industry moves to future process nodes.

The new facility will focus on LSI systems in five key areas – DVDs, DTVs, mobile communications equipment, SD memory cards and network-related equipment.

By: DocMemory
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