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Samsung breaks 80nm DRAM process barrier


Wednesday, May 26, 2004 Samsung Electronics succeeded in developing the world's first 70nm DRAM process technology, breaking the 80nm barrier which was considered the mark to overcome in the semiconductor industry.

Samsung announced it has developed the 70nm DRAM process technology by applying the metal-insulator-metal (MIM) capacitor technology using TiN electrode which can improve chip productivity by 30% compared to the existing 80nm process. It is expected that the company could enjoy competitiveness in production cost while increasing gravity in the production of highly profitable Flash memory products.

Last year, Samsung presented a paper on this 70nm process technology in the world-class very large scale integrated circuit (VLSI) symposium and IEEE Electron Device Society (IEDM) meeting. The technology is now pending patent overseas. The company has already finished verification by applying the metal capacitor process technology to 90nm 512-Mbit DRAMs, and expects to reveal 70nm-level 512-Mbit products this year.

Samsung has set a sales target of over US$6 billion through five DRAM production lines this year. The company believes it can hold a stronger position as an industry leader along with this development following release of the world's first 70nm Flash memory products last year.

Samsung's announcement on 70nm process technology is significant in terms of size reduction of the capacitor. Size has been a major issue in developing micro DRAM circuits. In addition, productivity can be improved by more than half when 90nm process is applied instead of the 0.11micron process. More than 65% productivity improvement can be expected with the new 70nm technology.

It is more than just a simple step forward from last year's 80nm process technology, given the extreme difficulties the industry has had so far in nanotechnology development with silicon. Except for Samsung, DRAM manufacturers in general including Micron, Infineon and Hynix are known to have experienced difficulties even with applying 0.11micron process to volume production.

"The 70nm process is a necessary technology in manufacturing high-performance, large-capacity semiconductor products. We are very pleased to secure the technology prior to other companies when the technical competition is becoming more severe. This will lead us ahead, creating a bigger technology gap with our competitors," said a Samsung executi

By: DocMemory
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